Photolithography Chemicals: Supplied by NFC


These chemicals are supplied by NFC. They are not to be taken out of the clean room.  These are general use chemicals and are available to all NFC users.  Photolithography chemicals are to be stored in a chemical cabinet or wetbench.  Photoresist are general use products.  They should have the product name and NFC listed as the user.  Do not label photoresist for individual use.

Products may be added or discontinued depending on use and availability.  Chemicals not on this list may be brought into the clean room ONLY with the lab managers approval and a copy of the MSDS.


Photoresist Type Thickness Range Process Data Sheet MSDS Developer
S1805 Positive 4 - 6 KÅ [  PDF 406kB] [  PDF 35kB] MF 319 Dev1;
351 Dev: H2O (1:5)
S1813 Positive 1.3 - 1.8 µ [  PDF 406kB] [  PDF 97kB] MF 319 Dev1;
351 Dev: H2O (1:5)
S1818 Positive 1.7 - 2.6 µ [  PDF 406kB] [  PDF 65kB] MF 319 Dev1;
351 Dev: H2O (1:5)
1045 Resist2 Positive 4.0 - 8.0 µ [  PDF 17MB] [  PDF 108kB] MF 319 Dev1;
351 Dev: H2O (1:5)
SPR 220-7 Positive 6.0 - 10.0 µ [  PDF 71kB] See Lab MF CD 26
SPR 220-43 Positive 3.6 - 6.8 µ [  PDF 71kB] See Lab MF CD 26
AZ® 9260 Photoresist (520 CPS) Positive 4.6 - 24 µ PDF from az-em.com [  PDF 486kB]4 AZ 400K : H20 (1:4)
SU-8 2010 Negative 10 - 20 µ [  PDF 124kB] [  PDF 41kB] SU8 Developer5,
PM Acetate
Futurrex NR7-1500P Negative 1.1 - 3.1 µ [  PDF 86kB] See Lab RD6
Futurrex NR1-3000PY Negative & Lift Off 2.2 - 6.0 µ [  PDF 120kB] See Lab RD6
LOR3A Lift Off 3 - 5.5 KÅ [  PDF 124kB] See Lab MF CD 26
LOR20B6 Lift Off 1.8 - 3.8 µ [  PDF 124kB] See Lab AZ 400K : H20 (1:4)

NOTES

  1. MF 319 is not always available.  It is supplied for specific projects.
  2. 1045 will be discontinued after the current supply is used.
  3. SPR 220-4 will be available after the current supply of 1045 runs out.
  4. I have a revised hard copy MSDS (revision date 07/11/2005) whose details are similar to the MSDS copy (version 4/14/97) posted on NFC's website.
  5. SU-8 Developer is not supplied by NFC.
  6. LOR20B may be replaced with LOR10B in the furture.