STS ETCH Rate Values
	PECVD	PECVD	Themal	Themal Ox	Low Stress	Regular	Resist	Resist	Resist	Resist	Bare Si
	Nitride-340	Oxide-340	Oxide	With Resist	Nitride	Nitride	1813	1818	HNR 80	5214
RECIPE
NIT 1	2575	406	367		868	~ 800	869	736		816	700
NIT 2		173	148		437	94	366				730
NIT 3		55	43		140	94	142				514
FASTPOLY	5615		216		640	~ 880 *	713	>600		662	~ 26,000 *
PJSNITD1	2492	597	572		213	1243 *	132
SLOWPOLY	3253		53		22	250	151				~ 8000  *
TYB-TEST	2673		317		99	~ 230 *	60				367
PJSOXIDE	2814	337	303	226	224	~ 220  *	124	93			92
O2CLEAN							1500	1450	1612		-4
		Etch values are listed in Ang per min rate, using only a single wafer, resist values are for hard baked layers.
		All values listed should be within 10% of those posted. These values are only a guide.
		For more exact etch rates testing should be done by the user with the intended material.
		* Means these recipes can have large varying etch values, test etch rate on a test sample first.									29-Jul-04