STS ETCHER Process info

Equipment: STS Etcher

Location: Bay3


This is a RIE  ( Reactive Ion Etcher ) made by STS model 320.  It uses a PC computer to control the gases which are Fluorine gases. The system is manually loaded and can hold several wafers at one time. The gas mixture, pressure, R.F. power, and time are items that can be programmed in a recipe. This recipe can be saved and used again later.

Larger Photo:    Click Here

Etch Rate Data:    Click Here

Go to the Equipment Link