STS ETCHER Process info
Equipment: STS Etcher
Location: Bay3

This is a RIE ( Reactive Ion Etcher ) made by STS model 320. It
uses a PC computer to control the gases which are Fluorine gases. The system
is manually loaded and can hold several wafers at one time. The gas mixture,
pressure, R.F. power, and time are items that can be programmed in a recipe.
This recipe can be saved and used again later.
Limits: